Publications (Open Access): Plasma-focused

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A. Anders, Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them, Appl. Phys. Rev., 11 (2024) 031310.

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A. Anders, Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS), J. Appl. Phys., 121 (2017) 171101.

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A. Anders, P. Ni, A. Rauch, Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering, J. Appl. Phys., 111 (2012) 053304.

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M. Rudolph, P. Birtel, T. Arnold, A. Prager, S. Naumov, U. Helmstedt, A. Anders, P.C. With, Low-temperature atmospheric pressure plasma conversion of polydimethylsiloxane and polysilazane precursor layers to oxide thin films, Plasma Processes and Polymers, 20 (2023) e2200229. Download from https://doi.org/10.1002/ppap.202200229

M. Rudolph, A. Revel, D. Lundin, N. Brenning, M.A. Raadu, A. Anders, T.M. Minea, J.T. Gudmundsson, On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge, Phys. Plasmas, 29 (2022) 023506.

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J.T. Gudmundsson, A. Anders, A. von Keudell, Foundations of physical vapor deposition with plasma assistance, Plasma Sources Science and Technology, 31 (2022) 083001.

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E. Bez, M. Himmerlich, P. Lorenz, M. Ehrhardt, A.G. Gunn, S. Pfeiffer, M. Rimoldi, M. Taborelli, K. Zimmer, P. Chiggiato, A. Anders, Influence of wavelength and accumulated fluence at picosecond laser-induced surface roughening of copper on secondary electron yield, J. Appl. Phys., 133 (2023) 035303.

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R. Franz, P. Polcik, A. Anders, Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres, Surf. Coat. Technol., 272 (2015) 309-321.

Download from https://doi.org/10.1016/j.surfcoat.2015.03.047

M. Rudolph, N. Brenning, H. Hajihoseini, M.A. Raadu, T.M. Minea, A. Anders, J.T. Gudmundsson, D. Lundin, Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge, J. Phys. D: Appl. Phys., 55 (2022) 015202.

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 M. Panjan, A. Anders, Plasma potential of a moving ionization zone in DC magnetron sputtering, J. Appl. Phys., 121 (2017) 063302.

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 S. Zöhrer, A. Anders, R. Franz, Influence of Ar gas pressure on ion energy and charge state distributions in pulsed cathodic arc plasmas from Nb–Al cathodes studied with high time resolution, J. Phys. D: Appl. Phys., 52 (2019) 055201.

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Y. Unutulmazsoy, D. Kalanov, K. Oh, S. Karimi Aghda, J.W. Gerlach, N. Braun, F. Munnik, A. Lotnyk, J.M. Schneider, A. Anders, Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc, J. Vac. Sci. Technol. A, 41 (2023).

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O. Lorenz, A. Kühne, M. Rudolph, W. Diyatmika, A. Prager, J.W. Gerlach, J. Griebel, S. Winkler, A. Lotnyk, A. Anders, B. Abel, Role of reaction intermediate diffusion on the performance of platinum electrodes in solid acid fuel cells, Catalysts, 11 (2021) 1065.

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T. Rembert, C. Battaglia, A. Anders, A. Javey, Room temperature oxide deposition approach to fully transparent, all-oxide thin-film transistors, Advanced Materials, 27 (2015) 6090-6095.

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X. Wang, Z. Gong, K. Dong, S. Lou, J. Slack, A. Anders, J. Yao, Tunable Bragg filters with a phase transition material defect layer, Opt. Express, 24 (2016) 20365-20372.

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J. Wang, V.R. Thota, E.A. Stinaff, M. Ebdah, A. Anders, W.M. Jadwisienczak, Structural and optical studies of InGaN/GaN superlattices implanted with Eu ions, MRS Advances, 2 (2017) 179-187.

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S. Zöhrer, M. Golizadeh, N. Koutná, D. Holec, A. Anders, R. Franz, Erosion and cathodic arc plasma of Nb–Al cathodes: composite versus intermetallic, Plasma Sources Sci. Technol., 29 (2020) 025022.

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D. Kalanov, J.W. Gerlach, C. Bundesmann, J. Bauer, A. Lotnyk, H. von Wenckstern, A. Anders, Y. Unutulmazsoy, Heteroepitaxial growth of Ga2O3 thin films on Al2O3(0001) by ion beam sputter deposition, J. Appl. Phys., 136 (2024) 015302.

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 S. Karimi Aghda, D.M. Holzapfel, D. Music, Y. Unutulmazsoy, S. Mráz, D. Bogdanovski, G. Fidanboy, M. Hans, D. Primetzhofer, A.S.J. Méndez, A. Anders, J.M. Schneider, Ion kinetic energy- and ion flux-dependent mechanical properties and thermal stability of (Ti,Al)N thin films, Acta Materialia, 250 (2023) 118864.

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 S. Karimi Aghda, D. Music, Y. Unutulmazsoy, H.H. Sua, S. Mráz, M. Hans, D. Primetzhofer, A. Anders, J.M. Schneider, Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films, Acta Materialia, 214 (2021) 117003.

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 D. Kalanov, S. Mandazhiev, J. Franze, A. Anders, Y. Unutulmazsoy, Decoupling the effects of potential energy, kinetic energy, and ion flux on crystallinity of V-Al and V-Al-N thin films in pulsed filtered cathodic arc deposition, Surf. Coat. Technol., 497 (2025) 131720.

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